Chamber X CAV Core
Advanced vacuum-based plasma technology for precision surface cleaning, activation and adhesion enhancement — programmable, scalable and built for laboratory and industrial production.
1-4 mbar
Vacuum level
100Hz–3kHz
Operating frequency
10–360 s
Treatment time
The name behind the technology
Controlled vacuum plasma for measurable surface outcomes.
Chamber X CAV Core is based on the principle that advanced plasma treatment should operate within a controlled and practical environment. Chamber X refers to the chamber in which the system operates, while CAV Core stands for Vacuum-Assisted Cold Plasma Core a low-temperature technology that uses reduced pressure to enhance surface interaction, antimicrobial performance, and access to biofilms.
Together, Chamber X CAV Core represents a scalable plasma platform designed for measurable outcomes, chemical-free operation, and seamless integration into laboratory, clinical, and industrial workflows.
Product overview
High-precision vacuum plasma treatment for surfaces at a microscopic level.
Chamber X utilizes low-pressure plasma technology to remove contaminants and activate surfaces at a microscopic level. This significantly enhances surface energy, improving adhesion for coating, bonding, and biomedical applications.
The system ensures uniform plasma distribution and stable process control for consistent, high-quality results across metals, polymers, ceramics and composite materials.
Vacuum Plasma
Low-pressure CAP process
HMI Touchscreen
Intuitive control interface
Full Parameter Control
Power, frequency, gas, time
CE · RoHS · ISO
Fully certified system
Applications
One chamber,
endless materials.
Chamber X delivers consistent, validated surface treatment results across a broad spectrum of materials and industries — from biomedical components to high-performance composites.
Key features
Engineered for precision and repeatability.
Advanced Plasma Technology
Vacuum-based plasma achieves deep surface cleaning and activation with superior precision and uniform distribution.
HMI Touchscreen Interface
High-resolution HMI with microcontroller-based system provides intuitive, guided operation and recipe storage.
Customizable Parameters
Adjust power, frequency (100 Hz–3 kHz), duty cycle (1–100%), gas flow and treatment duration independently.
Material Versatility
Compatible with metals, polymers, ceramics and composite materials — from biomedical parts to industrial components.
Low Maintenance
Long-life components and easily replaceable consumables. Designed to minimize downtime and maximize uptime.
Compact & Integrated
Space-efficient benchtop design allows seamless integration into laboratory and production line environments.
INDUSTRIAL SOLUTIONS
One Technology.
Endless Applications.
Pacem cold plasma solutions are transforming critical processes across healthcare, industrial, environmental, and consumer sectors.
Chamber X CAV Core in action
Vacuum-Assisted Cold Plasma System
Why Chamber X CAV Core?
- Vacuum environment ensures uniform plasma distribution across the entire surface
- Low-pressure process achieves deep surface penetration without thermal damage
- Full parameter control: power, frequency, gas type, and treatment duration
- Compatible with metals, polymers, ceramics, and composite materials
Process & safety
Optimized process cycles, documented safety limits.
Treatment time ranges from 10 to 360 seconds depending on the material and desired surface effect. Always follow the documented IFU and process parameters provided in the product manual.
Set your process parameters
Adjust power (360 W max), frequency (100 Hz–3 kHz), duty cycle (1–100%), and treatment time (10–360 s) via the HMI touchscreen.
Follow validated protocols
Treatment effectiveness is material-dependent. Use the provided IFU for recommended exposure times, gas types, and safety clearances.
Low maintenance by design
Long-life components and easily replaceable consumables minimize downtime. Full maintenance schedules are documented in the product manual.
CHAMBER X CAV CORE
Technical Specifications
Power Source
110/220V AC, 50/60Hz
Power Consumption
350 W (0-50kV)
Operating Frequency
100Hz - 3kHz
Duty Cycle
1% - 100%
Plasma Treatment Time
10 – 360 sec
Temperature
25- 40°C
Vacuum Level
1 – 4 mbar
Compliance
CE – RoHS – ISO
Catalogue & downloads
Everything for procurement & QA.
Product catalogue
Full specifications, form factors and model selector.
Technical Datasheet
Full technical data
Purchase
Reach us for further details concerning your request
GALLERY
The product, up close.
Ready when you are
Configure Chamber X for your production workflow.
For pricing, chamber configuration and process support, talk to our team. Technical summaries and validated protocols available on request.